Cathodic deposition from an aqueous solution containing the simple nit
rate salts of Nd3+ and Cu2+ yields insoluble thin-film oxyhydroxide la
yers. Variation of the electrode substrate, solute concentrations (abs
olute and relative, one to another), applied cathodic potential and ce
ll geometry allows the production of films with a wide range of precur
sor compositions. Conditions were optimised to allow production of a s
olid thin film which, on firing at 940 degrees C, yielded Nd2CuO4. Sin
ce the electrodeposited material comprises intimate mixtures of oxide,
subsequent firing to yield the desired semiconductor requires a relat
ively low firing temperature. The compositions of the products formed
are accounted for in terms of solubility constants and a reaction fron
t between the electrogenerated material and cations in the bulk soluti
on.