ELECTRODEPOSITION OF THIN-FILM RARE-EARTH-METAL OXOCUPRATES

Citation
R. Janes et al., ELECTRODEPOSITION OF THIN-FILM RARE-EARTH-METAL OXOCUPRATES, Journal of materials chemistry, 6(2), 1996, pp. 183-186
Citations number
19
Categorie Soggetti
Chemistry Physical","Material Science
ISSN journal
09599428
Volume
6
Issue
2
Year of publication
1996
Pages
183 - 186
Database
ISI
SICI code
0959-9428(1996)6:2<183:EOTRO>2.0.ZU;2-B
Abstract
Cathodic deposition from an aqueous solution containing the simple nit rate salts of Nd3+ and Cu2+ yields insoluble thin-film oxyhydroxide la yers. Variation of the electrode substrate, solute concentrations (abs olute and relative, one to another), applied cathodic potential and ce ll geometry allows the production of films with a wide range of precur sor compositions. Conditions were optimised to allow production of a s olid thin film which, on firing at 940 degrees C, yielded Nd2CuO4. Sin ce the electrodeposited material comprises intimate mixtures of oxide, subsequent firing to yield the desired semiconductor requires a relat ively low firing temperature. The compositions of the products formed are accounted for in terms of solubility constants and a reaction fron t between the electrogenerated material and cations in the bulk soluti on.