OPTICAL CHARACTERIZATION OF WAVE-GUIDE BASED PHOTONIC MICROSTRUCTURES

Citation
Tf. Krauss et Rm. Delarue, OPTICAL CHARACTERIZATION OF WAVE-GUIDE BASED PHOTONIC MICROSTRUCTURES, Applied physics letters, 68(12), 1996, pp. 1613-1615
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
12
Year of publication
1996
Pages
1613 - 1615
Database
ISI
SICI code
0003-6951(1996)68:12<1613:OCOWBP>2.0.ZU;2-C
Abstract
Third-order, one-dimensional, semiconductor-air gratings have been des igned, fabricated, and evaluated by optical waveguide transmission mea surements. Gratings with as little as six unit cells show a clear band edge around 840-850 nm. Owing to our approach of semiconductor-rich l attices with small airgaps, the diffractive spreading loss is sufficie ntly small (similar to 50% in the passband) for meaningful results to be extracted. The measurements indicate that the optical waveguide app roach is a good starting point for the study of photonic microstructur es and that practical device concepts can be implemented. (C) 1996 Ame rican Institute of Physics.