PHOTORADICAL PROCESSES IN FLUORINATED POL YSTYRENE

It was established that the appearance of perfluorocarbon radicals as a result of low-temperature (77 K) photolysis of fluorinated polystyre ne (PS) enhances the photosensitivity of the polymer. The quantum yiel d of radical formation increases by 2-3 orders of magnitude by compari son with that for the radicals of unfluorinated PS. High reactivity of radical species produced during the photolysis of fluorinated PS is r evealed in the reactions of recombination and oxidation at 77 K. When UV- or gamma-radiation may used to activate the fluorine-containing ra dicals during the direct fluorination of polymers.