PHOTOCHEMISTRY AND PATTERNING OF SELF-ASSEMBLED MONOLAYER FILMS CONTAINING AROMATIC HYDROCARBON FUNCTIONAL-GROUPS

The deep ultraviolet (lambda < similar to 250 nm) photochemistry of ch emisorbed organosilane self-assembled films of the type R(CH2)(n)SiO-s urface where n = 0, 1, 2 and R = phenyl, naphthyl, or anthracenyl is e xplored. Photochemistry is examined using 193 and 248 nm laser irradia tion as well as deep ultraviolet lamp sources. It is demonstrated for a variety of systems, including single and multiple rings as well as h eterocycles, that the primary photochemical mechanism is cleavage of t he Si-C bond. Photocleavage of the organic group generates a polar, we ttable silanol surface that is amenable to subsequent remodification b y organosilane chemisorption, allowing the fabrication of high-resolut ion patterns of chemical functional groups in a single molecular plane . The use of patterned monolayers as templates of reactivity for subse quent selective chemical reactions is demonstrated.