DETERMINATION OF THE MORPHOLOGY OF DEPOSITED ISLANDS BY GRAZING-INCIDENCE SMALL-ANGLE SCATTERING

It is shown that grazing-incidence small-angle X-ray scattering (GISAX S) is a suitable technique to study the morphology of gold islands dep osited on a silicon wafer covered by a carbon sublayer. New possibilit ies of this technique are realized when using no a synchrotron source (flux and collimation) and when patterns are recorded with image plate s (IPs). It is possible to study the anisotropic shape of the scatteri ng pattern and to deduce the dimensions of the deposited clusters whic h are formed by the Volmer-Weber mechanism of film growth. Quantitativ e measurements can be made with a reference sample, leading to an abso lute value of the scattered intensity.