NANOMETER-SIZED SILICON CRYSTALLITES PREPARED BY EXCIMER-LASER ABLATION IN CONSTANT-PRESSURE INERT-GAS

Citation
T. Yoshida et al., NANOMETER-SIZED SILICON CRYSTALLITES PREPARED BY EXCIMER-LASER ABLATION IN CONSTANT-PRESSURE INERT-GAS, Applied physics letters, 68(13), 1996, pp. 1772-1774
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
13
Year of publication
1996
Pages
1772 - 1774
Database
ISI
SICI code
0003-6951(1996)68:13<1772:NSCPBE>2.0.ZU;2-A
Abstract
We report nanometer-sized silicon (Si) crystallites prepared by excime r laser ablation in constant pressure inert gas ambient. Size distribu tion of the Si ultrafine particles depends on the pressure of inert ga s ambients. The relation between the average size and the ambient pres sure can be explained by an inertia fluid model. It is verified that t he size of the Si ultrafine particles is similar to 3 nm and greater i n diameter. Furthermore, crystallinity of the nanoscale ultrafine part icles is crystalline similar to that of bulk Si. (C) 1996 American Ins titute of Physics.