We investigate the interactions between hydrogen and dopant impurities
in GaN, using state-of-the-art first-principles calculations. Our res
ults for energetics and migration reveal a fundamental difference in t
he behavior of hydrogen between p-type and n-type material; in particu
lar, we explain why hydrogen concentrations in n-type GaN are low, and
why hydrogen has a beneficial effect on acceptor incorporation in p-t
ype GaN. Our results identify the conditions under which hydrogen can
be used to control doping in semiconductors in general. (C) 1996 Ameri
can Institute of Physics.