IRON DIFFUSIVITY IN SILICON - IMPACT OF CHARGE-STATE - COMMENT

Authors
HEISER T MESLI A
Citation
T. Heiser et A. Mesli, IRON DIFFUSIVITY IN SILICON - IMPACT OF CHARGE-STATE - COMMENT, Applied physics letters, 68(13), 1996, pp. 1868-1869
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
68
Issue
13
Year of publication
1996
Pages
1868 - 1869
Database
ISI
SICI code
0003-6951(1996)68:13<1868:IDIS-I>2.0.ZU;2-4