DEEP CENTER SCATTERING POTENTIAL IN INGAP

Citation
Qs. Zhu et al., DEEP CENTER SCATTERING POTENTIAL IN INGAP, Journal of applied physics, 76(11), 1994, pp. 7410-7414
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
11
Year of publication
1994
Pages
7410 - 7414
Database
ISI
SICI code
0021-8979(1994)76:11<7410:DCSPII>2.0.ZU;2-X
Abstract
Mobility limited by the scattering of a phosphorous vacancy-induced de ep center in In0.5Ga0.5P alloy grown by liquid-phase epitaxy on a (100 ) GaAs substrate has been investigated by means of Hall mobility and d eep-level transient spectroscopy measurements. Two kinds of scattering potentials, Gaussian well type and square-well type, were considered. It was found that the scattering potential can be better described by the Gaussian-type potential than the square-well one. The mobility li mited by deep center scattering has been fully calculated and analyzed . As a result, the mobility is characterized by a temperature dependen ce of T--1/2 in the temperature range from 77 to 400 K. The point defe ct scattering severely reduces the total mobility as its concentration increases. In addition, the scattering case when there is an electron trapped in the Gaussian potential well was also quantitatively invest igated. (C) 1994 American Institute of Physics.