Mw. Kissick et al., DEPENDENCE OF ION-MATRIX DOSE ON DENSITY FOR PLANAR, CYLINDRICAL, ANDSPHERICAL ELECTRODES, Journal of applied physics, 76(11), 1994, pp. 7616-7618
Ion-matrix dose dependence calculations for plasma source: ion implant
ation in planar, cylindrical, and spherical geometries are presented.
It is demonstrated that in the high plasma density limit (in relation
to the applied electrode potential and electrode size), the spherical
and cylindrical cases approach the planar case. However, in the low re
lative density limit, the density dependencies diverge with the depend
ence vanishing for the spherical case, remaining unchanged for the pla
nar case, and with the cylindrical case lying between the previous two
. (C) 1994 American Institute of Physics.