DEPENDENCE OF ION-MATRIX DOSE ON DENSITY FOR PLANAR, CYLINDRICAL, ANDSPHERICAL ELECTRODES

Ion-matrix dose dependence calculations for plasma source: ion implant ation in planar, cylindrical, and spherical geometries are presented. It is demonstrated that in the high plasma density limit (in relation to the applied electrode potential and electrode size), the spherical and cylindrical cases approach the planar case. However, in the low re lative density limit, the density dependencies diverge with the depend ence vanishing for the spherical case, remaining unchanged for the pla nar case, and with the cylindrical case lying between the previous two . (C) 1994 American Institute of Physics.