Characterization is one important component in the ensemble of photovo
ltaics research and development efforts. It has supported the evolutio
n of the technology, and measurement techniques have themselves evolve
d in response to the technology's needs. This paper highlights some im
portant evaluation and verification techniques, covering macroscale th
rough nanooscale characterization methods. Some emphasis is placed upo
n the lower spatial resolution regimes, in which the characterization
and processing of semiconductors are leading to areas of atomic engine
ering of materials.