PULSED-LASER DEPOSITION AND CHARACTERIZATION OF ZRO2-AL2O3 FILMS

Thin films of ZrO2-Al2O3 have been produced by pulsed laser deposition from targets that were mixtures of ZrO2 and Al2O3 with a pre-selected composition. The chemical composition of the film was the same as tha t of the target as determined by Rutherford back scattering (RBS). As deposited, the films were amorphous. Annealing the films at 1000 degre es C for 24 h in air resulted in the formation of a tetragonal phase o f zirconia as determined by X-ray diffraction.