MULTILAYER HARD COATINGS BY COORDINATED SUBSTRATE ROTATION MODES IN INDUSTRIAL PVD DEPOSITION SYSTEMS

Film growth conditions in an industrial PVD cathodic are process are a nalyzed theoretically and experimentally under consideration of substr ate rotation effects. Two substrate rotation modes are selected for in vestigations of rotation effects to the coating properties. Typical in dustrial conditions for the deposition parameters of the (Ti,Al)C,N co atings are applied. Samples from different positions of the sample car rier are characterized by optical microscopy of ball craters (Calotest ), by Rockwell indentation tests and by depth-sensing indentation meas urements. Effects of the different rotation modes to the resulting dif ferent layer architectures are determined.