NEW TRENDS ON NITRIDING IN LOW-PRESSURE ARE DISCHARGES STUDIED BY OPTICAL-EMISSION SPECTROSCOPY

Citation
N. Renevier et al., NEW TRENDS ON NITRIDING IN LOW-PRESSURE ARE DISCHARGES STUDIED BY OPTICAL-EMISSION SPECTROSCOPY, Surface & coatings technology, 87-8(1-3), 1996, pp. 285-291
Citations number
22
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
87-8
Issue
1-3
Year of publication
1996
Part
1
Pages
285 - 291
Database
ISI
SICI code
0257-8972(1996)87-8:1-3<285:NTONIL>2.0.ZU;2-E
Abstract
The purpose of this work is to present the first results obtained by o ptical emission spectroscopy (OES) in a high current, low voltage and low pressure are discharge used for steel nitriding. The apparatus is mainly constituted of an ionisation chamber mounted on the top of the nitriding reactor itself. In this process, workpieces are nitrided at floating potential in Ar-N-2 gas mixtures. OES measurements are done i n pure argon for different are currents and different gas pressures in the reactor. This plasma diagnostic technique has been used to charac terize the different excitation processes of both neutral and ionic ar gon species. In the case of Ar-N-2 gas mixtures a strong quenching eff ect of nitrogen on the electron energy distribution function is observ ed. OES measurements obtained for various nitrogen percentages in Ar-N -2 gas mixtures are compared to the results obtained by metallurgical analysis of nitrided Armco iron substrates in the same conditions.