N. Renevier et al., NEW TRENDS ON NITRIDING IN LOW-PRESSURE ARE DISCHARGES STUDIED BY OPTICAL-EMISSION SPECTROSCOPY, Surface & coatings technology, 87-8(1-3), 1996, pp. 285-291
The purpose of this work is to present the first results obtained by o
ptical emission spectroscopy (OES) in a high current, low voltage and
low pressure are discharge used for steel nitriding. The apparatus is
mainly constituted of an ionisation chamber mounted on the top of the
nitriding reactor itself. In this process, workpieces are nitrided at
floating potential in Ar-N-2 gas mixtures. OES measurements are done i
n pure argon for different are currents and different gas pressures in
the reactor. This plasma diagnostic technique has been used to charac
terize the different excitation processes of both neutral and ionic ar
gon species. In the case of Ar-N-2 gas mixtures a strong quenching eff
ect of nitrogen on the electron energy distribution function is observ
ed. OES measurements obtained for various nitrogen percentages in Ar-N
-2 gas mixtures are compared to the results obtained by metallurgical
analysis of nitrided Armco iron substrates in the same conditions.