VERY HIGH-RATE COATING DEPOSITION WITH INTENSE ION AND OR ELECTRON-BOMBARDMENT/

The principles of a new method of high rate coating deposition are pre sented which are based on a pulsed ion diode with explosive emission. The equipment is flexible and can work in three regimes: pulsed ion be ams, pulsed electron beams, and the deposition of films and coatings. Coatings can be deposited with ion beam mixing (coating and/or substra te), and these can be post treated with intense pulsed electron beams which allows the properties to be extensively modified. Experimental r esults are presented on a variety of coatings deposited on the charact eristics of the diode and on different substrate materials at differen t temperatures; specific examples include high temperature superconduc tors, Tin, Tib(2) and diamond-like carbon films.