LINEAR ARC-DISCHARGE (LAD) - A NEW-TYPE OF HOLLOW-CATHODE PLASMA SOURCE

A novel linearly scalable source for low pressure plasma processing is described. The source is based on a parallel plate hot hollow cathode in a focusing magnetic field which allows generation of a linearly un iform plasma in a gas admitted into the slit between the plates. Resul ts of experiments with the laboratory prototype of 10 cm long linear a re discharge (LAD) source supplied by a 13.56 MHz max. 2 kW radio freq uency (r.f.) generator are presented. An r.f. impedance probe was used to characterize the discharge. The optical emission from Ar discharge along the slit between Ti cathode plates in the LAD was monitored to study production of Ti and Ti+ ions at different experimental characte ristics, e.g. varying the r.f. power, gas flows and gas pressure. Firs t results on Ti film depositions are presented. Experiments show that the discharge performance of the LAD source is similar to the r.f. hol low cathode plasma jet (RHCPJ). The LAD source can favorably extend RH CPJ abilities to large area processing.