THE ROLE OF THE PLASMON MECHANISM IN THE SECONDARY-ELECTRON EMISSION IN LIF

Citation
Ai. Gusarov et Sv. Murashov, THE ROLE OF THE PLASMON MECHANISM IN THE SECONDARY-ELECTRON EMISSION IN LIF, Surface science, 320(3), 1994, pp. 361-368
Citations number
19
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
320
Issue
3
Year of publication
1994
Pages
361 - 368
Database
ISI
SICI code
0039-6028(1994)320:3<361:TROTPM>2.0.ZU;2-Z
Abstract
Energy distributions of secondary electrons emitted by LiF monocrystal s were measured for various energies and angles of incidence of the pr imary electron beam. The analysis has shown the dominating role of the plasmon mechanism of secondary electron generation. On this base a si mple model to calculate the secondary electron yield has been develope d. This model made it possible to estimate the contribution of each me chanism of secondary electron generation to the total yield. Good agre ement between experimental and calculated data was found. It has been also shown that in LiF the plasmon mechanism can produce up to 90 perc ent of the total number of escaped secondary electrons.