MODELIZATION OF REACTION-KINETICS OF NITROGEN AND TITANIUM DURING TINARC DEPOSITION

Reactive are deposition is a very complex non-linear process in which many parameters are involved. These parameters can be either dependent or independent variables. Consequently, it is difficult to control th e process by experimental observations. Therefore, for a better unders tanding of reactive are evaporation mechanisms and proper selection of appropriate plasma and deposition conditions, a simple model based on reaction kinetics and energy balance should be defined. According to this model it is possible to predict phenomena occurring at the cathod e and influencing the reactive deposition at the substrate. For reacti ve are deposition of TiN films, this model will deal with poisoning an d gettering effects of nitrogen and titanium respectively. It will emp hasize their influence on the evaporation rate, deposition rate and su bsequently emission and deposition of the microparticles. Experimental results and measurements on reactive are deposition of TiN are report ed and verified using the theoretical model.