REACTIVE SPUTTERING OF MOLYBDENUM SULFIDE THIN-FILMS

Authors
OBENG JA SCHRADER GL
Citation
Ja. Obeng et Gl. Schrader, REACTIVE SPUTTERING OF MOLYBDENUM SULFIDE THIN-FILMS, Surface & coatings technology, 68, 1994, pp. 422-426
Citations number
45
Categorie Soggetti
Materials Science, Coatings & Films
Journal title
Surface & coatings technology → ACNP
ISSN journal
02578972
Volume
68
Year of publication
1994
Pages
422 - 426
Database
ISI
SICI code
0257-8972(1994)68:<422:RSOMST>2.0.ZU;2-#
Abstract
MoSx films have been deposited by r.f sputtering of an Mo target in an H2S/Ar atmosphere. Relationships between process conditions and chemi cal composition, crystalline orientation, and morphology suggest that control of MoSx film properties are summarized. Preparation of dense, thick MoSx films with x > 1.8 and with preferred ''basal'' orientation is shown.