DETERMINATION OF THE CHEMICAL AND PHYSICAL-PROPERTIES OF HYDROGENATEDCARBON DEPOSITS PRODUCED BY DC MAGNETRON REACTIVE SPUTTERING

Hydrogenated carbon deposits on silicon substrate have been prepared b y magnetron-enhanced reactive sputtering in a C2H2-Ar gas mixture with a carbon autofeeding target system. The hydrogen content and the dens ity of the hydrogenated carbon deposits have been determined by elasti c recoil detection analysis and related to the C2H2:Ar gas flow ratio. The characteristics of carbon-hydrogen and carbon-carbon bonds have b een investigated by Fourier transform IR spectrometry. The mechanical properties were investigated by nanoindentation. This systematic study reveals a dependence of film properties on gas composition. This depe ndence can be used to tune film properties to specific applications. A s the acetylene flow increases, the hydrogen concentration increases, and films have a decreasing density, decreasing hardness and decreasin g Young's modulus.