IMAGING SEMICONDUCTOR WAFERS USING PHOTOLUMINESCENCE

Citation
Sf. White et al., IMAGING SEMICONDUCTOR WAFERS USING PHOTOLUMINESCENCE, Optical engineering, 33(12), 1994, pp. 3974-3977
Citations number
8
Categorie Soggetti
Optics
Journal title
ISSN journal
00913286
Volume
33
Issue
12
Year of publication
1994
Pages
3974 - 3977
Database
ISI
SICI code
0091-3286(1994)33:12<3974:ISWUP>2.0.ZU;2-F
Abstract
A facility for producing photoluminescence (PL) images of semiconducto r wafers at cryogenic temperatures is described. A custom-designed liq uid helium cryostat capable of accepting 50-mm-diam wafers is used tog ether with a scanning optical table for PL excitation and collection. Spectral analysis is achieved by the use of a CCD detector mounted on a standard grating spectrometer. The configuration used enables a full spectrum to be recorded for each point on a wafer with a spatial reso lution of approximately 100 mu m. The spectral information may be used to produce images of the total PL intensity, the peak PL intensity, a nd the wavelength at which the peak intensity occurs. Typical PL maps are presented to illustrate the quality of the information.