EXTREME-ULTRAVIOLET STUDIES WITH LASER-PRODUCED PLASMAS

Citation
Et. Kennedy et al., EXTREME-ULTRAVIOLET STUDIES WITH LASER-PRODUCED PLASMAS, Optical engineering, 33(12), 1994, pp. 3984-3992
Citations number
26
Categorie Soggetti
Optics
Journal title
ISSN journal
00913286
Volume
33
Issue
12
Year of publication
1994
Pages
3984 - 3992
Database
ISI
SICI code
0091-3286(1994)33:12<3984:ESWLP>2.0.ZU;2-Z
Abstract
A new multilaser multichannel spectrometer system has been developed t hat allows a wide range of investigations of the interaction of extrem e-ultraviolet (EUV) photons with matter in the form of free atoms or i ons, e.g., in gases or plasmas or bound as in solids. The EUV photons are generated by a laser-produced plasma. Applications to the study of photoabsorption by thin foils, gases, and ground- and excited-state a toms and ions are described. The design and performance of a collimate d, quasi-monochromatic, intense source of EUV radiation based on the c ombination of a laser-produced plasma with a EUV multilayer mirror is also reported.