Bj. Gould et al., CHEMICAL-VAPOR-DEPOSITION OF ZRO2 THIN-FILMS MONITORED BY IR SPECTROSCOPY, Journal of materials chemistry, 4(12), 1994, pp. 1815-1819
Thin films of ZrO2 have been grown under kinetic control by decomposit
ion of zirconium tetra-tert-butoxide onto quartz substrates. The resul
ting films have been characterised by optical and electron microscopy
and X-ray diffraction. A phase transition from a poorly crystalline, m
etastable form of zirconia to the monoclinic phase showing a strong pr
eferred orientation takes place as the substrate temperature is raised
from 450 to 500 degrees C. The decomposition of the precursor has bee
n followed by ex situ infrared spectroscopy, allowing monitoring of th
e gas-phase products as a function of substrate temperature. The possi
ble mechanism for the decomposition reaction is discussed.