DAMAGE AND ANNEALING OF POTASSIUM TITANYL PHOSPHATE AFTER ER+ AND YB+IMPLANTATION

Citation
Km. Wang et al., DAMAGE AND ANNEALING OF POTASSIUM TITANYL PHOSPHATE AFTER ER+ AND YB+IMPLANTATION, Solid state communications, 92(12), 1994, pp. 997-999
Citations number
10
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
92
Issue
12
Year of publication
1994
Pages
997 - 999
Database
ISI
SICI code
0038-1098(1994)92:12<997:DAAOPT>2.0.ZU;2-4
Abstract
200-350 keV Er+ and Yb+ were implanted into potassium titanyl phosphat e (KTP or KTiOPO4), The dose ranged from 1 x 10(13) to 5 x 10(13) ions cm(-2). The radiation damage was investigated by RBS (Rutherford back scattering spectrometry)/channeling as a function of dose, energy, ion mass and annealing. The results show that the damage in KTiOPO4 depen ds strongly on the dose, energy, ion mass and annealing. After 800 deg rees C annealing, some recrystallization was observed, but there remai ned damage for KTiOPO4 (100) irradiated by 200 keV Er+ at a dose of 2 x 10(13) ions cm(-2) which is a little different from the report on th e case of 400 keV He ions implanted into the KTP.