Km. Wang et al., DAMAGE AND ANNEALING OF POTASSIUM TITANYL PHOSPHATE AFTER ER+ AND YB+IMPLANTATION, Solid state communications, 92(12), 1994, pp. 997-999
200-350 keV Er+ and Yb+ were implanted into potassium titanyl phosphat
e (KTP or KTiOPO4), The dose ranged from 1 x 10(13) to 5 x 10(13) ions
cm(-2). The radiation damage was investigated by RBS (Rutherford back
scattering spectrometry)/channeling as a function of dose, energy, ion
mass and annealing. The results show that the damage in KTiOPO4 depen
ds strongly on the dose, energy, ion mass and annealing. After 800 deg
rees C annealing, some recrystallization was observed, but there remai
ned damage for KTiOPO4 (100) irradiated by 200 keV Er+ at a dose of 2
x 10(13) ions cm(-2) which is a little different from the report on th
e case of 400 keV He ions implanted into the KTP.