ION KINETIC ASPECTS OF PLASMA CHEMICAL-DEPOSITION OF PMMA (POLYMETHYLMETHACRYLATE) FILMS

Citation
Mj. Zeuner et J. Meichsner, ION KINETIC ASPECTS OF PLASMA CHEMICAL-DEPOSITION OF PMMA (POLYMETHYLMETHACRYLATE) FILMS, Vacuum, 46(1), 1995, pp. 27-31
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
VacuumACNP
ISSN journal
0042207X
Volume
46
Issue
1
Year of publication
1995
Pages
27 - 31
Database
ISI
SICI code
0042-207X(1995)46:1<27:IKAOPC>2.0.ZU;2-8
Abstract
Ion kinetic investigations were performed during the deposition of PMM A (Polymethylmethacrylate) films using a 27.12 MHz driven parallel pla te discharge configuration. The time dependent change of total pressur e, partial pressures and growth rate were measured and the quantitativ e concentration of the most important gaseous reaction products is sho wn, which allows the observed growth rate to be understood At the grou nded electrode of the discharge arrangement, ion mass spectra and ion energy distributions were measured. in the ion mass spectra a large nu mber of higher molecular weight ions was found.