Gm. Mikhailov et al., INVESTIGATION OF THE EFFECTS OF PRETREATMENT ON THE INTERACTION BETWEEN A GAAS(100) SURFACE AND AN OXYGEN (ECR) PLASMA, Vacuum, 46(1), 1995, pp. 65-68
The interaction between oxygen and a GaAs(100) surface in an electron
cyclotron (ECR) plasma was studied by XPS and Auger spectroscopy. Both
stoichiometric and Ga-rich oxides were found to be formed. The oxide
composition of 1+X1As1-X1O4-X1/Ga1+X2As1-X2O3/Ga1+X3OyAs1-X3/GaAs type
s depend on the substrate temperature and on the pretreatment of the G
aAs surface. The Ga oxide formed during the pretreatment procedure sig
nificantly affects the interaction between the GaAs(100) surface and t
he O-2 (ECR) plasma.