REACTIVE MAGNETRON SPUTTERING DEPOSITION OF TIN FILMS .2. INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE MECHANICAL-PROPERTIES OF THE FILMS

The study of the influence of the TiN-growing films, obtained by magne tron sputtering, on their mechanical properties is the aim of this pap er. Microhardness, adhesion and wear resistance are studied. In order to explain their evolution, these properties are correlated with each other and with the microstructure and the morphology of the films. It is shown that films with a (111) texture which are relatively hard (20 GPa) exhibit poor wear resistance. Films with a (200) texture present simultaneously high microhardness (25 GPa) and good wear resistance. It is also shown that the presence of internal stresses depending on t he structure and morphology of the films tends to drastically decrease the wear resistance. The internal stress level depends greatly on the deposition temperature.