FORMATION OF CUCL ULTRAFINE PARTICLES IN SILICA GLASS BY ION-IMPLANTATION

Silica glass dispersed with CuCl ultrafine particles is prepared by th e implantation of 3 MeV 6 X 10(16) Cl2+ ions cm(-2) and 3 MeV 6 X 10(1 6) Cu2+ ions cm(-2). It is deduced that the implanted Cu ions form mai nly ultrafine Cu metallic particles in the as-implanted silica glass. The ultrafine Cu metallic particles react with Cl atoms to form CuCl u ltrafine particles by heating up to 900-1000 degrees C. The number of Cu and Cl ions forming the CuCl ultrafine particles is consistent with the fluence levels of these ions. A large number of CuCl ultrafine pa rticles can be dispersed in silica glass.