CHARACTERIZATION OF AMORPHOUS TUNGSTEN TRIOXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING METHOD

Citation
T. Nanba et al., CHARACTERIZATION OF AMORPHOUS TUNGSTEN TRIOXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING METHOD, Journal of non-crystalline solids, 178, 1994, pp. 233-237
Citations number
9
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
178
Year of publication
1994
Pages
233 - 237
Database
ISI
SICI code
0022-3093(1994)178:<233:COATTT>2.0.ZU;2-T
Abstract
Amorphous tungsten trioxide thin films were prepared using a rf magnet ron sputtering method. The relation between structure and electrochrom ic properties was investigated, At the macroscopic level, the films ha d dense structures. From Raman spectroscopic and X-ray radial distribu tion analyses, it was deduced that the networks were basically formed by three-, four- and six-membered rings of corner-sharing WO6 octahedr a, and in the films with low O/W atomic ratios many edge-sharing units were present. It was also found that the films with high O/W ratios s howed good electrochromic properties, which were closely related to th e six-membered rings,