Zirconium silicon oxide films were deposited by de reactive magnetron
sputtering of Zr-Si alloy targets. The character and durability of the
se films were investigated. Thin film X-ray diffraction analyis showed
that the film structure changed from crystalline to amorphous with an
abrupt decrease of internal stress for an SiO2 content of more than 2
0 mol%. Reduction of friction due to the amorphous structure was relat
ed to an improved mechanical durability. Films with an SiO2 content of
30-90 mol% were favorable as a durable protection layer. Taber abrasi
on of a double-layer system (amorphous Zr-Si oxide/TiNx/glass) indicat
ed that not only the reduction of friction but also the oxide thicknes
s was a key factor for the improved mechanical resistance.