EJECTION OF POSITIVE-IONS FROM PLASMAS INDUCED BY LASER-ABLATION OF SI AND ND1.85CE0.15CUO4

Authors
VANINGEN RP
Citation
Rp. Vaningen, EJECTION OF POSITIVE-IONS FROM PLASMAS INDUCED BY LASER-ABLATION OF SI AND ND1.85CE0.15CUO4, Journal of applied physics, 76(12), 1994, pp. 8055-8064
Citations number
51
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
76
Issue
12
Year of publication
1994
Pages
8055 - 8064
Database
ISI
SICI code
0021-8979(1994)76:12<8055:EOPFPI>2.0.ZU;2-3