MECHANISM OF NEGATIVE-BIAS TEMPERATURE INSTABILITY IN POLYCRYSTALLINE-SILICON THIN-FILM TRANSISTORS

Authors
MAEDA S MAEGAWA S IPPOSHI T NISHIMURA H ICHIKI T MITSUHASHI J ASHIDA M MURAGISHI T INOUE Y NISHIMURA T
Citation
S. Maeda et al., MECHANISM OF NEGATIVE-BIAS TEMPERATURE INSTABILITY IN POLYCRYSTALLINE-SILICON THIN-FILM TRANSISTORS, Journal of applied physics, 76(12), 1994, pp. 8160-8166
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
76
Issue
12
Year of publication
1994
Pages
8160 - 8166
Database
ISI
SICI code
0021-8979(1994)76:12<8160:MONTII>2.0.ZU;2-0