LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SIO2

Authors
DESHMUKH SC AYDIL ES
Citation
Sc. Deshmukh et Es. Aydil, LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SIO2, Applied physics letters, 65(25), 1994, pp. 3185-3187
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
65
Issue
25
Year of publication
1994
Pages
3185 - 3187
Database
ISI
SICI code
0003-6951(1994)65:25<3185:LPCOS>2.0.ZU;2-G