THICK GOLD-FILM DEPOSITION BY HIGH-REPETITION VISIBLE PULSED-LASER CHEMICAL-VAPOR-DEPOSITION

A highly conductive gold film, over 10 mum-thick with well-controlled linewidth, has been successfully deposited from dimethyl-gold-acetylac etonate and its fluorinated derivative by pyrolytic CVD (Chemical Vapo r Deposition) with a high-repetition, visible, pulsed laser. The therm al damage to the polyimide substrate has been substantially suppressed by reducing the thermal diffusion length within 0.2 mum in pulsed-las er-induced transient heating, in contrast to the cw laser-CVD scheme. Reproducible and low contact resistance as low as 0.5 OMEGA between th e written line and the existing gold line has been obtained. Sufficien tly tough adhesion to polyimide has been observed for the deposit from dimethyl-gold-acetylacetonate. Reasonable agreement has been obtained between the observed deposition characteristics and analytical result s for precursor supply rate and temperature increase during short-puls e irradiation.