DESIGN AND CERTIFICATION OF HIGH-PURITY DELIVERY SYSTEMS FOR SEMICONDUCTOR WAFER CLEANING CHEMICALS

The wafer cleaning procedures used in new semi-conductor manufacturing facilities require extremely high purity chemicals. Delivering chemic als of this quality requires careful management of the chemicals from their manufacturing site to the points of use (POUs) within the wafer fabrication facility (fab). Chemical management includes proper chemic al production, transportation to the wafer fab and design and operatio n of the chemical delivery system within the fab. This paper describes the technology used to supply 15 different types of chemicals to more than 60 POUs in the TECH Semiconductor wafer fab in Singapore. The ce rtification and continuous monitoring program confirms sub-ppb chemica l delivery with particle concentrations of < 3 particles/ml at greater -than-or-equal-to 0.2 mum. Several challenges associated with the init ial design and installation of the chemical delivery system and their resolution are also described.