BAXSR1-XTIO3 THIN-FILMS BY A CHEMICAL PROCESS

Citation
Za. Burhanuddin et al., BAXSR1-XTIO3 THIN-FILMS BY A CHEMICAL PROCESS, Thin solid films, 253(1-2), 1994, pp. 53-56
Citations number
9
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
253
Issue
1-2
Year of publication
1994
Pages
53 - 56
Database
ISI
SICI code
0040-6090(1994)253:1-2<53:BTBACP>2.0.ZU;2-O
Abstract
Stoichiometric Ba-x Sr-1-x TiO3 samples with various values of x were prepared by a solution method. The starting materials were titanium is opropoxide and hydroxides of barium and strontium. Powders were obtain ed by evaporation of the precursor solution, and thin films were depos ited by spin coating. The annealing temperature required to obtain com plete conversion to the crystalline material increases with increasing x and ranges from 150 to 600 degrees C. High quality polycrystalline films of Ba0.5Sr0.5 TiO3 were achieved on a silicon substrate at 550 O C, Leakage current as a function of applied voltage (I-V) measurements on the metal-insulator-semiconductor structure (where the insulating layer is Ba0.5Sr0.5 TiO3 film) on n-type silicon substrates showed dio de-like behavior.