TRANSPORT THROUGH MULTICOMPONENT DUAL-FREQUENCY PLASMA SHEATHS

Citation
Fr. Myers et al., TRANSPORT THROUGH MULTICOMPONENT DUAL-FREQUENCY PLASMA SHEATHS, Thin solid films, 253(1-2), 1994, pp. 522-528
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
253
Issue
1-2
Year of publication
1994
Pages
522 - 528
Database
ISI
SICI code
0040-6090(1994)253:1-2<522:TTMDPS>2.0.ZU;2-B
Abstract
We used Monte Carlo simulations (MCS) to study the transport of ions t hrough single and dual frequency, multicomponent plasma sheaths during plasma enhanced deposition of silicon dioxide from TEOS and oxygen mi xtures (PETEOS). First, we used our dual frequency plasma sheath model (DFPSM) to predict the potential as a function of position and time a nd the sheath thickness as a function of time. We then performed the M onte Carlo simulations to determine the angular and energy distributio n functions for a selected species striking the substrate, taking into account a variety of collision types. Our DFPSM predictions as well a s our distribution function predictions are in reasonable agreement wi th most available experimental data. There is little experimental info rmation available with which to compare our multicomponent and dual fr equency predictions; however, the trends observed are consistent with explanations often used to interpret trends in film properties.