We used Monte Carlo simulations (MCS) to study the transport of ions t
hrough single and dual frequency, multicomponent plasma sheaths during
plasma enhanced deposition of silicon dioxide from TEOS and oxygen mi
xtures (PETEOS). First, we used our dual frequency plasma sheath model
(DFPSM) to predict the potential as a function of position and time a
nd the sheath thickness as a function of time. We then performed the M
onte Carlo simulations to determine the angular and energy distributio
n functions for a selected species striking the substrate, taking into
account a variety of collision types. Our DFPSM predictions as well a
s our distribution function predictions are in reasonable agreement wi
th most available experimental data. There is little experimental info
rmation available with which to compare our multicomponent and dual fr
equency predictions; however, the trends observed are consistent with
explanations often used to interpret trends in film properties.