INTERDIGITATED MICROELECTRODE ARRAYS BASED ON SPUTTERED CARBON THIN-FILMS

Thin-film carbon microelectrodes deposited by RF sputtering onto a Si/ Si3N4 substrate are presented. By optimizing the deposition parameters , films showing low resistivity (10(-3) Omega cm) and good adhesion ar e achieved. Physical, spectroscopic and electrochemical characterizati ons are carried out. The electrocatalytical properties of the carbon t hin-films are assessed with and without surface activation. Successful patterning in O-2 plasma is demonstrated by the fabrication of interd igitated microelectrode arrays featuring a resolution of 2 mu m. The a nalytical performance of the interdigitated microelectrodes is illustr ated by the detection of dopamine over a concentration range of 50 nM to 100 mu M.