ANOMALOUS DIFFUSION OF IODINE IONS INTO POLYPROPYLENE IMPLANTED WITH F+ AND I+ IONS

The diffusion of K and I atoms from 5 M water solution of KI into poly propylene implanted with 150 keV F+ and I+ was studied at boiling temp erature. Standard Rutherford back scattering (RSB) technique was used for the determination of concentration depth profiles of diffused atom s. It was found that the I and K atoms penetrate the polymer surface l ayer affected by ion implantation and they are captured by trapping ce nters produced by electronic energy losses of implanted ions. The upta ke of K atoms is several times higher than that of I atoms, and the re lative K concentration exceeds the KI stoichiometric value. (C) 1995 J ohn Wiley and Sons, Inc.