PHOTODEPOSITION OF THIN POLYDIACETYLENE FILMS FROM SOLUTION THAT EXHIBIT LARGE 3RD-ORDER OPTICAL NONLINEARITIES

Authors
PALEY MS FRAZIER DO ABDELDAYEM H MCMANUS SP
Citation
Ms. Paley et al., PHOTODEPOSITION OF THIN POLYDIACETYLENE FILMS FROM SOLUTION THAT EXHIBIT LARGE 3RD-ORDER OPTICAL NONLINEARITIES, Chemistry of materials, 6(12), 1994, pp. 2213-2215
Citations number
7
Categorie Soggetti
Chemistry Physical","Material Science
Journal title
Chemistry of materials → ACNP
ISSN journal
08974756
Volume
6
Issue
12
Year of publication
1994
Pages
2213 - 2215
Database
ISI
SICI code
0897-4756(1994)6:12<2213:POTPFF>2.0.ZU;2-E
Abstract
A novel technique has been developed for preparing thin amorphous film s of a polydiacetylene derivative of 2-methyl-4-nitroaniline (MNA) usi ng photodeposition from monomer solutions. This heretofore unknown pro cess yields films that possess very high optical quality and exhibit l arge third-order nonlinear optical susceptibilities (10(-8)-10(-7) esu ). Photodeposition can also be carried out using lasers to form thin o ptical circuits. This could eventually make the application of polydia cetylene thin films for nonlinear optical devices such as waveguides a nd integrated optics more commercially feasible.