OH-RELATED CAPACITANCE-VOLTAGE RECOVERY EFFECT IN MOS CAPACITORS PASSIVATED BY PBO-B2O3-SIO2-GEO2 GLASSES - THE EFFECTS OF OH CONTENT

Citation
K. Kobayashi et I. Mizushima, OH-RELATED CAPACITANCE-VOLTAGE RECOVERY EFFECT IN MOS CAPACITORS PASSIVATED BY PBO-B2O3-SIO2-GEO2 GLASSES - THE EFFECTS OF OH CONTENT, Journal of non-crystalline solids, 180(1), 1994, pp. 84-87
Citations number
14
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
180
Issue
1
Year of publication
1994
Pages
84 - 87
Database
ISI
SICI code
0022-3093(1994)180:1<84:OCREIM>2.0.ZU;2-6
Abstract
The purpose of this work is to clarify the relationship between some o f the properties of MOS capacitors passivated by lead borosilicate gla sses and the hydroxyl contents of the glasses. When PbO content decrea sed and network forming oxides such as B2O3, SiO2 and GeO2 increased, OH absorption coefficients increased and C-V curve shifts, V(G), in MO S capacitors increased. These effects were due to the increase of hydr oxyl contents, which depended on the lead borosilicate glass compositi ons. A good recovery effect in hysteresis loops was observed in MOS ca pacitors passivated by glasses with a small quantity of hydroxyl ions.