FABRICATION OF SUBMICROMETER PARALLELOGRAMIC-SHAPED GRATINGS IN SIO2

Authors
LI M LIN JCH CHERRILL MJ SHEARD SJ
Citation
M. Li et al., FABRICATION OF SUBMICROMETER PARALLELOGRAMIC-SHAPED GRATINGS IN SIO2, Electronics Letters, 30(25), 1994, pp. 2126-2128
Citations number
5
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
Electronics Letters → ACNP
ISSN journal
00135194
Volume
30
Issue
25
Year of publication
1994
Pages
2126 - 2128
Database
ISI
SICI code
0013-5194(1994)30:25<2126:FOSPGI>2.0.ZU;2-M
Abstract
The fabrication process of submicrometre parallelogramic-shaped gratin gs is reported, which involves an image reversal resist process and a novel oblique reactive ion etching (RIE) configuration. A submicrometr e parallelogramic grating with 40 degrees blaze angle is fabricated us ing this method.