DISCHARGE AND CIRCUIT SIMULATION OF A PLASMA CATHODE TEA HF LASER OPERATING WITH A HE SF6/C3H8 GAS-MIXTURE/

Authors
TSIKRIKAS GN SERAFETINIDES AA
Citation
Gn. Tsikrikas et Aa. Serafetinides, DISCHARGE AND CIRCUIT SIMULATION OF A PLASMA CATHODE TEA HF LASER OPERATING WITH A HE SF6/C3H8 GAS-MIXTURE/, Optics communications, 134(1-6), 1997, pp. 145-148
Citations number
6
Categorie Soggetti
Optics
Journal title
Optics communications → ACNP
ISSN journal
00304018
Volume
134
Issue
1-6
Year of publication
1997
Pages
145 - 148
Database
ISI
SICI code
0030-4018(1997)134:1-6<145:DACSOA>2.0.ZU;2-D
Abstract
A circuit and discharge simulation is presented for a TEA HF laser ope rating with a He/SF6/C3H8 gas mixture. A comparison of the simulated d ischarge voltage, current, resistance and input power with the corresp onding experimental results is presented together with a discussion on the factors affecting the simulation accuracy.