HEAT PULSE-PROPAGATION IN SI SUBSTRATES AFTER YBCO LASER-ABLATION

The propagation of heat pulses produced in thin silicon wafers by phot oexcitation is investigated before and after the YBCO laser ablation. The Monte-Carlo simulation and analysis of the heat pulse shape led to conclusion about the introducing into the Si substrate of the accepto r type additional centers in the process of laser ablation. These cent ers turn to be phonon scatterers and therefore change the heat transfe r velocity.