EFFECT OF PULSE PARAMETERS ON THE DEPOSITION RATE OF HYDROGENATED AMORPHOUS-SILICON IN A MODIFIED PULSED PLASMA DISCHARGE

Authors
ANANDAN C MUKHERJEE C SETH T DIXIT PN BHATTACHARYYA R
Citation
C. Anandan et al., EFFECT OF PULSE PARAMETERS ON THE DEPOSITION RATE OF HYDROGENATED AMORPHOUS-SILICON IN A MODIFIED PULSED PLASMA DISCHARGE, Applied physics letters, 66(1), 1995, pp. 85-87
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
1
Year of publication
1995
Pages
85 - 87
Database
ISI
SICI code
0003-6951(1995)66:1<85:EOPPOT>2.0.ZU;2-T