ANNEALING BEHAVIOR OF CARBON-OXYGEN COMPLEXES IN SILICON-CRYSTALS OBSERVED BY LOW-TEMPERATURE INFRARED-ABSORPTION

Citation
Y. Shirakawa et al., ANNEALING BEHAVIOR OF CARBON-OXYGEN COMPLEXES IN SILICON-CRYSTALS OBSERVED BY LOW-TEMPERATURE INFRARED-ABSORPTION, Journal of applied physics, 77(1), 1995, pp. 41-46
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
77
Issue
1
Year of publication
1995
Pages
41 - 46
Database
ISI
SICI code
0021-8979(1995)77:1<41:ABOCCI>2.0.ZU;2-Q