EFFECT OF FLUORINE ON BORON-DIFFUSION IN THIN SILICON DIOXIDES AND OXYNITRIDE

Authors
AOYAMA T SUZUKI K TASHIRO H TODA Y YAMAZAKI T TAKASAKI K ITO T
Citation
T. Aoyama et al., EFFECT OF FLUORINE ON BORON-DIFFUSION IN THIN SILICON DIOXIDES AND OXYNITRIDE, Journal of applied physics, 77(1), 1995, pp. 417-419
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
1
Year of publication
1995
Pages
417 - 419
Database
ISI
SICI code
0021-8979(1995)77:1<417:EOFOBI>2.0.ZU;2-Y