A. Bosacchi et al., EFFECTS OF HYDROGENATION OF DEEP AND SHALLOW LEVELS IN ALGAAS GROWN BY MBE, Materials science & engineering. B, Solid-state materials for advanced technology, 28(1-3), 1994, pp. 425-428
The effects of treatments with hydrogen plasma (hydrogenation) and of
subsequent annealing (dehydrogenation) on the photoluminescence effici
ency and on the net donor and deep level concentrations in AlxGa1-xAs
grown by molecular beam epitaxy are reported. It is shown that hydroge
nation results in the passivation of the shallow donors, whose electri
cal and optical activities are partially restored after dehydrogenatio
n. It is also shown that deep centres such as ME5, ME6 and DX are pass
ivated by hydrogenation. The DX centre is restored to a significant ex
tent by dehydrogenation, whereas the ME5 and ME6 defects are reactivat
ed only to a minor extent. The strong increase in the PL efficiency ob
served after hydrogenation and its dependence on growth temperature ar
e shown to be consistent with the dominant role of the ME5 and ME6 cen
tres on the non-recombination process in AlxGa-xAs.