S. Juodkazis et al., MAPPING OF GAAS WAFERS BY IR LIGHT-DIFFRACTION AND LUMINESCENCE, Materials science & engineering. B, Solid-state materials for advanced technology, 28(1-3), 1994, pp. 448-451
Optical investigations were carried out on undoped as well as on Cr-do
ped semi-insulating GaAs(100) wafers. The distribution of the non-equi
librium charge carrier grating erasure time tau(E) across GaAs wafers
has been investigated by means of picosecond laser-induced dynamic gra
ting and picosecond-photoconductivity techniques. Additional photolumi
nescence data have been obtained to reveal the contamination of GaAs w
afers. The influence of high temperature annealing conditions on the d
istribution of the deep level EL2 and on the tau(E) mapping data has b
een studied. Also, feasibility of dynamic grating and picosecond-photo
conductivity techniques for checking GaAs wafer quality is shown. Reco
mbination through the deep levels EL2 and Cr are discussed.