DEEP-ETCH LITHOGRAPHY AT LURE-DCI STORAGE-RING

Authors
MEGTERT S LABEQUE A LIU ZW DEXPERT H COMES R ROUSSEAUX F RAVET MF LAUNOIS H BALLANDRAS S DANIAU W BASROUR S ROUILLAY M BLIND P HAUDEN D
Citation
S. Megtert et al., DEEP-ETCH LITHOGRAPHY AT LURE-DCI STORAGE-RING, Journal de physique. IV, 4(C9), 1994, pp. 269-272
Citations number
3
Categorie Soggetti
Physics
Journal title
Journal de physique. IV → ACNP
ISSN journal
11554339
Volume
4
Issue
C9
Year of publication
1994
Pages
269 - 272
Database
ISI
SICI code
1155-4339(1994)4:C9<269:DLALS>2.0.ZU;2-9
Abstract
LIGA technique has proved to be a powerful tool for micro-fabrication mass production. French laboratories (LURE, L2M, LPMO) gathered to int roduce this new technology at LURE facilities. In this paper are descr ibed the different steps of the deep etch lithography process includin g mask realization and first pseudo-tridimensional resist structures a re shown.